JPH0519329Y2 - - Google Patents

Info

Publication number
JPH0519329Y2
JPH0519329Y2 JP1987180403U JP18040387U JPH0519329Y2 JP H0519329 Y2 JPH0519329 Y2 JP H0519329Y2 JP 1987180403 U JP1987180403 U JP 1987180403U JP 18040387 U JP18040387 U JP 18040387U JP H0519329 Y2 JPH0519329 Y2 JP H0519329Y2
Authority
JP
Japan
Prior art keywords
wafer
tray
wafers
raw material
auxiliary tool
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1987180403U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0187157U (en]
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987180403U priority Critical patent/JPH0519329Y2/ja
Publication of JPH0187157U publication Critical patent/JPH0187157U/ja
Application granted granted Critical
Publication of JPH0519329Y2 publication Critical patent/JPH0519329Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP1987180403U 1987-11-26 1987-11-26 Expired - Lifetime JPH0519329Y2 (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987180403U JPH0519329Y2 (en]) 1987-11-26 1987-11-26

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987180403U JPH0519329Y2 (en]) 1987-11-26 1987-11-26

Publications (2)

Publication Number Publication Date
JPH0187157U JPH0187157U (en]) 1989-06-08
JPH0519329Y2 true JPH0519329Y2 (en]) 1993-05-21

Family

ID=31471925

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987180403U Expired - Lifetime JPH0519329Y2 (en]) 1987-11-26 1987-11-26

Country Status (1)

Country Link
JP (1) JPH0519329Y2 (en])

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5852680U (ja) * 1981-10-05 1983-04-09 松下電器産業株式会社 ビデオカセツト
JPH0329321Y2 (en]) * 1985-09-24 1991-06-21

Also Published As

Publication number Publication date
JPH0187157U (en]) 1989-06-08

Similar Documents

Publication Publication Date Title
JP4570699B2 (ja) 基板支持装置および堆積チャンバシールド組立体
JP5371785B2 (ja) Rfシャッター
TWI570835B (zh) 用於基板處理室的兩片擋板盤組件
US6736946B2 (en) Physical vapor deposition apparatus with modified shutter disk and cover ring
JPH0348204Y2 (en])
JP2015520799A (ja) 太陽電池製造のための2重マスク装置
US9147558B2 (en) Finned shutter disk for a substrate process chamber
JPH10150096A (ja) ワークピースの縁部をシールドする装置
JP7404268B2 (ja) 自己センタリング特徴を有するツーピースシャッタディスクアセンブリ
KR20200110710A (ko) 감소된 크기의 기판들을 처리하기 위한 증착 링
JPH0519329Y2 (en])
US20100051673A1 (en) Method and device for transferring a solder deposit configuration
CN100540726C (zh) 用于镀覆表面的模块化装置
US20230323525A1 (en) Substrate processing apparatus and cover ring assembly
JPH06156624A (ja) 載置物の置き台
JP2000216233A (ja) 基板支持チャックにウェ―ハスぺ―シングマスクを製作する方法及び装置
CN216303977U (zh) 蒸镀锅和蒸镀设备
JP2001181845A5 (ja) 成膜装置及び被処理体の処理方法
JPH06299355A (ja) 真空成膜装置
JP2000178732A (ja) 半導体ウエハーに対する蒸着用マスク板の重ね固定方法及びその装置
JPS609856B2 (ja) 非晶質薄膜形成法
JP2000114201A (ja) 蒸着装置
JPH0713217Y2 (ja) 半導体製造装置の下部電極
US5785518A (en) Masking element fixture
JP3071635B2 (ja) 両面パターニング方法およびその装置