JPH0519329Y2 - - Google Patents
Info
- Publication number
- JPH0519329Y2 JPH0519329Y2 JP1987180403U JP18040387U JPH0519329Y2 JP H0519329 Y2 JPH0519329 Y2 JP H0519329Y2 JP 1987180403 U JP1987180403 U JP 1987180403U JP 18040387 U JP18040387 U JP 18040387U JP H0519329 Y2 JPH0519329 Y2 JP H0519329Y2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- tray
- wafers
- raw material
- auxiliary tool
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987180403U JPH0519329Y2 (en]) | 1987-11-26 | 1987-11-26 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987180403U JPH0519329Y2 (en]) | 1987-11-26 | 1987-11-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0187157U JPH0187157U (en]) | 1989-06-08 |
JPH0519329Y2 true JPH0519329Y2 (en]) | 1993-05-21 |
Family
ID=31471925
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1987180403U Expired - Lifetime JPH0519329Y2 (en]) | 1987-11-26 | 1987-11-26 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0519329Y2 (en]) |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5852680U (ja) * | 1981-10-05 | 1983-04-09 | 松下電器産業株式会社 | ビデオカセツト |
JPH0329321Y2 (en]) * | 1985-09-24 | 1991-06-21 |
-
1987
- 1987-11-26 JP JP1987180403U patent/JPH0519329Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0187157U (en]) | 1989-06-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4570699B2 (ja) | 基板支持装置および堆積チャンバシールド組立体 | |
JP5371785B2 (ja) | Rfシャッター | |
TWI570835B (zh) | 用於基板處理室的兩片擋板盤組件 | |
US6736946B2 (en) | Physical vapor deposition apparatus with modified shutter disk and cover ring | |
JPH0348204Y2 (en]) | ||
JP2015520799A (ja) | 太陽電池製造のための2重マスク装置 | |
US9147558B2 (en) | Finned shutter disk for a substrate process chamber | |
JPH10150096A (ja) | ワークピースの縁部をシールドする装置 | |
JP7404268B2 (ja) | 自己センタリング特徴を有するツーピースシャッタディスクアセンブリ | |
KR20200110710A (ko) | 감소된 크기의 기판들을 처리하기 위한 증착 링 | |
JPH0519329Y2 (en]) | ||
US20100051673A1 (en) | Method and device for transferring a solder deposit configuration | |
CN100540726C (zh) | 用于镀覆表面的模块化装置 | |
US20230323525A1 (en) | Substrate processing apparatus and cover ring assembly | |
JPH06156624A (ja) | 載置物の置き台 | |
JP2000216233A (ja) | 基板支持チャックにウェ―ハスぺ―シングマスクを製作する方法及び装置 | |
CN216303977U (zh) | 蒸镀锅和蒸镀设备 | |
JP2001181845A5 (ja) | 成膜装置及び被処理体の処理方法 | |
JPH06299355A (ja) | 真空成膜装置 | |
JP2000178732A (ja) | 半導体ウエハーに対する蒸着用マスク板の重ね固定方法及びその装置 | |
JPS609856B2 (ja) | 非晶質薄膜形成法 | |
JP2000114201A (ja) | 蒸着装置 | |
JPH0713217Y2 (ja) | 半導体製造装置の下部電極 | |
US5785518A (en) | Masking element fixture | |
JP3071635B2 (ja) | 両面パターニング方法およびその装置 |